Paragraf expands MoS₂ production
New wafer-scale MoS₂ capability supports UK research into lower-power electronics for AI and high-performance computing.
Paragraf has expanded its 2D materials production capabilities to include molybdenum disulphide (MoS₂), an ultrathin semiconductor being developed for energy-efficient electronic devices.
The company is the lead industrial partner in the £6.4 million EPSRC-funded NEED2D programme, which brings together Queen Mary University of London and 22 industrial partners to develop 2D-material-based electronics for applications including artificial intelligence and high-performance computing.
Paragraf will supply wafer-scale MoS₂ to the programme, drawing on its existing expertise in producing large-area graphene on semiconductor substrates. The material can be integrated with silicon structures or used as a standalone semiconductor.
The programme aims to develop devices with significantly lower energy consumption than conventional silicon-based electronics, addressing power requirements associated with increasingly demanding AI and data centre workloads.
Paragraf said its expanded materials capability will support the development and evaluation of MoS₂-based devices and help advance the industrialisation of 2D semiconductor technologies.










